CyberOptics Highlights Best-Practices for Detecting Particles in Semiconductor Environments at SPIE

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CyberOptics Corporation, a leading global developer and manufacturer of high-precision 3D sensing technology solutions, will exhibit at SPIE Advanced Lithography and Patterning from April 27-28 at the San Jose Convention Center in California, booth #217. During the show, the company will feature the In-Line Particle Sensor (IPS) and ReticleSense wireless sensors for improved yields and productivity.

An extension of the industry-leading WaferSense and ReticleSense Airborne Particle Sensor (APS) technology that is documented by fabs as the Best Known Method (BKM), the In-Line Particle Sensor (IPS) with CyberSpectrum software detects particles in gas and vacuum lines 24/7. The IPS quickly identifies, monitors and enables troubleshooting of particles down to 0.1µm.

The IPS can be installed in any gas or vacuum system, and it is particularly relevant for EUVL tools where the ability to monitor particles in-line can significantly improve tool yield and productivity. For example, it can be installed at the vacuum line in between the EUV process chamber and the vacuum pump, saving significant time compared to current methods. The IPS is always on and collecting particle data, which is especially critical during chamber purging.

Process and equipment engineers in semiconductor fabs can speed equipment qualification with real-time monitoring, compare past and present data, as well as one tool to another. Contamination sources can be identified quickly and the effects of cleaning, adjustments and repairs can be seen in real-time. Fabs can shorten equipment maintenance cycles, lower equipment expenses and optimize preventative maintenance plans.

CyberOptics will also demonstrate the ReticleSense Airborne Particle Sensor (APSRQ) and the ReticleSense Auto Multi Sensor (AMSR) for wireless leveling, vibration, and relative humidity (RH) measurements.