MechSE Researchers Create One-step Graphene Patterning Method

Researchers from the University of Illinois at Urbana-Champaign have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible substrates.

Graphene, a two-dimensional carbon allotrope, has received immense scientific and technological interest. Combining exceptional mechanical properties, superior carrier mobility, high thermal conductivity, hydrophobicity, and potentially low manufacturing cost, graphene provides a superior base material for next generation bioelectrical, electromechanical, optoelectronic, and thermal management applications.

“In conjunction with the recent evolution of additive and subtractive manufacturing techniques such as 3D printing and computer numerical control milling, we developed a simple and scalable graphene patterning technique using a stencil mask fabricated via a laser cutter,” stated Keong Yong, a graduate student and first author of the paper, “Rapid Stencil Mask Fabrication Enabled One-Step Polymer-Free Graphene Patterning and Direct Transfer for Flexible Graphene Devices" appearing in Scientific Reports.

Nam stated that this approach demonstrates a new possibility to overcome limitations imposed by existing post-synthesis processes to achieve graphene micro-patterning. Yong envisions this facile approach to graphene patterning sets forth transformative changes in “do It yourself” (DIY) graphene-based device development for broad applications including flexible circuits/devices and wearable electronics.

“This method allows rapid design iterations and pattern replications, and the polymer-free patterning technique promotes graphene of cleaner quality than other fabrication techniques,” Nam said. “We have shown that graphene can be patterned into varying geometrical shapes and sizes, and we have explored various substrates for the direct transfer of the patterned graphene.”

In addition to Nam and Yong, study co-authors include Ali Ashraf and Pilgyu Kang from the Department of Mechanical Science and Engineering at Illinois.