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Imec Demonstrates Electrical Yield for 20nm Pitch Metal Lines Obtained with High NA EUV Single Patterning

02/26/2025 | Imec
At SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.

DuPont to Discuss Development of EUV Photoresists at SPIE Advanced Lithography + Patterning Conference

02/13/2025 | DuPont
DuPont today announced its participation in the 2025 SPIE Advanced Lithography + Patterning conference, taking place Feb. 24–28 in San Jose, California. DuPont will showcase its latest innovations through technical presentations focused on the development of photoresists for extreme ultraviolet (EUV) lithography and advancing sustainability in the design of lithographic materials.

Sunny Stalnaker of ASML to Receive SEMI Sales and Marketing Excellence Award

01/30/2025 | ASML
SEMI announced that Sunny Stalnaker of ASML has won the 2025 SEMI Sales and Marketing Excellence Award, inspired by Bob Graham.

Biden-Harris Administration Designates Albany NanoTech as First CHIPS for America R&D Flagship

10/31/2024 | U.S. Department of Commerce
The Department of Commerce and Natcast, the operator of the National Semiconductor Technology Center (NSTC), announced the expected location for the first CHIPS for America research and development (R&D) flagship facility.

NY Lands First National Semiconductor Facility

10/31/2024 | Governor Kathy Hochul
Governor Kathy Hochul celebrated the designation of NY CREATES’ Albany NanoTech Complex as the location of the CHIPS for America EUV Accelerator, an NSTC facility.
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