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Zuken and Aras Partner to Deliver Ideal EDM/PLM Environment
August 24, 2016 | ZukenEstimated reading time: 1 minute
Zuken and Aras have entered into a partnership to develop a new approach for managing cross-discipline product development processes that include electrical and electronic design data from design creation to manufacturing. The new solution will span enterprise processes across the lifecycle, as well as detailed electrical design and manufacturing.
The partnership will deliver functionality that couples a domain-specific work-in-process (WIP) library and design data management system, with the enterprise PLM platform. The result will replace traditional “zip-up-the-directory” functionality with significant new capabilities that include where-used traceability for IP blocks and components, merging of design and manufacturing processes, and enhanced ECO processes.
“Zuken and Aras see a future where the electronic and mechanical design processes are coordinated more effectively to enable true systems engineering,” said Peter Schroer, CEO of Aras. “We believe that by working together we can provide a more holistic approach to support the business of engineering.”
Zuken will provide DS-2™, an engineering data management (EDM) solution for managing work-in-process library and design data for circuit/board development. DS-2 is a domain-specific solution for managing native design data across multiple sites in a project-oriented fashion.
“Manufacturers are using digital solutions in increasingly sophisticated ways to dramatically boost productivity,” said Kazuhiro Kariya, Managing Director and Chief Technology Officer at Zuken, Inc. “We are partnering with Aras to enable new processes for multi-disciplinary collaboration across the enterprise.”
Aras will provide Aras Innovator, an enterprise-level PLM platform and suite, for the complex systems engineering processes in product development, manufacturing, quality and the supply chain. The combination will provide engineers across the organization with improved data integrity and more efficient processes from design through to manufacturing.
The new solution is planned to be available early in the 2017 calendar year.
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