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“Cleaning Process Efficiency: Static and Dynamic Cleaning Rates” Webinar Presented by ZESTRON Academy
August 5, 2015 | ZESTRONEstimated reading time: 1 minute
ZESTRON, the globally leading provider of high precision cleaning products, services and training solutions for the electronics and semiconductor industries, is pleased to announce the sixth installment of ZESTRON Academy’s 2015 webinar series, “Cleaning Process Efficiency: Static and Dynamic Cleaning Rates” will be held on August 20th, at 1:30 PM EDT.
Does the Static Cleaning Rate (SCR) guarantee Dynamic Cleaning Rate (DCR) performance? Selecting a cleaning agent for a cleaning process begins with an analysis of its SCR as it relates to the residues to be removed. However, it’s equally important to gain an understanding of the cleaning agent’s DCR and its performance within the process. This webinar presents the results of an experimental study designed to explore this relationship.
Who should attend?
The content of this webinar is designed for production line operators, manufacturing and quality managers as well as process engineers within the electronics manufacturing industry.
For more information or to register for this webinar, please email us at academy@zestronusa.com, or visit our website.
About ZESTRON:
Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics manufacturing industry. With six worldwide technical centers and the largest team of chemical engineers in the industry, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.
For additional information and to tour one of our unparalleled technical centers, please visit www.zestron.com.
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